A novel parallel computing framework for chemical process simulation has been proposed by researchers from the East China University of Science and Technology and the University of Sheffield. This ...

Lithography processes were modeled on the basis of coarse-grained polymer simulation techniques using OCTA, which is the simulation software for soft materials, and the simulations of these processes ...

First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

Driven by the need to objectively measure the progress of their verification efforts and the contributions of different verification techniques, IC designers have adopted coverage as a metric. However ...